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Scanning electron microscopy (SEM) and atomic force microscopy (AFM) were used to observe the surface and cross section of the samples. The films obtained are homogeneous and have good adhesion to the substrate. We use as a substrate a commercial aluminosilicate float glass, which resists the deposition temperature of 850 ☌. The batch-type hot-wall CVD reactor uses SiHCl3 as precursor, H2 as carrier and reaction gas, BBr3 as p-type dopant, and PCl3 as n-type dopant. In this work we use atmospheric pressure chemical vapor deposition (AP-CVD) to deposit thin layers of polycrystalline silicon (poly-Si) on glass substrates.
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